Nova’s expertise in Thin Film and Optical CD & shape profiling metrology systems are addressing the complex measurement and process control challenges of High Volume Production (HVM) in 300 & 200 mm IC manufacturing, from 90nm to the demanding 45nm and 32nm technology nodes.

In the area of patterning, Nova offers comprehensive metrology solutions for Etch and Lithography, with a variety of Integrated and Standalone Metrology products.