Nova systems are based on a high accuracy normal-incidence polarized spectral reflectometer. The technology facilitates measurements of complex 2D and 3D scatterometry application on scribe-line and in-die sites as well as characterization of multilayer thin film stacks.
Nova’s solution is a compact design that performs high-throughput measurements enabling installation in scatterometry tools on both Stand Alone platforms and Integrated Metrology modules.
Technology advantage of normal-incidence measurements:
Normal incidence is inherently more stable and accurate for scatterometry applications. The concept is orders of magnitude less susceptible to errors caused by incidence angle variations in relation to high oblique angle systems.
Tool-to-tool matching capabilities:
Nova has unique expertise in robust system calibration based on extensive experience providing customers with large fleets of matched tools. The ability to match tools in production and retain the tool matching over the life of the tool across multiple fabs is a deciding factor in achieving tool-to-tool matching in general and fleet-matching in particular. This advantage has been recognized at a number of evaluations at customer sites.
Combined with our modeling and analysis SW, we achieve a high level of accuracy and repeatability, bringing our traceable Total Measurement Uncertainty (TMU) to the highest level in the industry.